Thermal Processing Technology
Semiconductor Burn-In Oven
The Semiconductor Burn-In Oven is designed for accelerated stress testing to identify early-life failures and ensure long-term reliability of semiconductor devices. By subjecting components to controlled thermal stress conditions, latent defects can be detected prior to deployment, reducing the risk of in-field failures.
Engineered with advanced thermal management systems, the oven ensures precise temperature control, uniform heat distribution, and reliable heat dissipation to prevent localized overheating and guarantee consistent test conditions across all devices under test (DUTs).
Chamber Volume: 7 to 21 cubic feet
Operating Temperature Range: Ambient to +210 °C
Heat Dissipation Capacity: 5 kW at 125 °C
Temperature Uniformity: +3 °C (measured without load at 125 °C)
Temperature Control Accuracy: +0.5 °C
Automation: Integrated system for automatic Burn-In Board (BIB) loading and unloading