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INDUSTRIAL OVENS
GENTRON OVEN GT2000-18 (N2 INLET)
Engineered specifically for applications such as high dissipation Forward Bias, high Temperature Reverse Bias, Dynamic and Static Burn-In of Integrated Chips, and other Semiconductor devices.
Specification:
- Temperature Range: Ambient to +200 °C
- Operating Temperature: 150 °C
- Control Accuracy: ±1.0 °C
- Temperature Uniformity: ±3 °C without load at 125 °C (9 points)
- Control: PLC with HMI
- Temperature Recorder: Yokogawa 12 Channels
- Heat Dissipation: 7.5Kw at 125 °C
- Heating: 12Kw
- Vent: Fresh air inlet auto damper and exhaust auto damper
- Nitrogen Inlet: Timer Control
- Circulating Fan: Centrifugal Fan Blower Horizontal Air Circulation
Engineered specifically for applications such as high dissipation Forward Bias, high Temperature Reverse Bias, Dynamic and Static Burn-In of Integrated Chips, and other Semiconductor devices.
Specification:
- Temperature Range: Ambient to +200 °C
- Operating Temperature: 150 °C
- Control Accuracy: ±1.0 °C
- Temperature Uniformity: ±3 °C without load at 125 °C (9 points)
- Control: PLC with HMI
- Temperature Recorder: Yokogawa 12 Channels
- Heat Dissipation: 7.5Kw at 125 °C
- Heating: 12Kw
- Vent: Fresh air inlet auto damper and exhaust auto damper
- Nitrogen Inlet: Timer Control
- Circulating Fan: Centrifugal Fan Blower Horizontal Air Circulation
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