INDUSTRIAL OVENS

GENTRON GT2010-14 CHAMBER


GENTRON GT2010-14 CHAMBER is designed to perform accelerated life testing of Microcircuit Electronic devices to identify its possibility of early mortalities.

Engineered specifically for applications such as high dissipation forward bias, high temperature reverse bias, dynamic and static burn-in of Integrated Chips and other semiconductor devices.

It’s application includes Operation Temperature range is at 10 ºC up to 220 ºC  and workspace volume of 14 cu.  ft.. Designed with reliable temperature control with 16 slots burn-in rack.



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GENTRON GT2010-14 IS SPECIFICALLY ENGINEERED FOR APPLICATIONS SUCH AS HIGH DISSIPATION FORWARD BIAS, HIGH TEMPERATURE REVERSE BIAS, DYNAMIC AND STATIC BURN-IN OF INTEGRATED CHIPS AND OTHER SEMICONDUCTOR DEVICES.

Chamber volume 14 cu. Ft
Temperature range +10 °C to 220 °C
Power Consumption 380 VAC, 3 Phase, 50Hz / 60 Hz
Control RKC Temperature Controller
Sensor Type ‘J’ Thermocouple
Motor full load amperes 3 H.P. / 3.95 A
Heating 12 KW / 18.25 A
Cooling 5HP, R404A single stage refrigeration system
Air-cooled condenser
Compressor Full load : 18.5 A
Circulating Fan Centrifugal fan blower, direct drive
Air velocity min. 2 m/s at outlet
Adjustable plates at air outlet
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